Halbreich, Kathy et al. SIGMAR POLKE: Alibis 1963-2010. 320 pages, including 520 color plates. 4to, cloth. New York, Museum of Modern Art, 2014.
One of the most influential artists of the post-war generation, Polke worked in a wide range of media, including painting, photography, film, drawing, Xerox, collage, and sculpture. Documenting the first exhibition to encompass the artist's work across all media, this well- illustrated publication provides an overview of Polke's cross-disciplinary innovations and career.
Kathy Halbreich's introduction (66 pages in) lays the groundwork for a more informed understanding of his work, followed by 16 essays that expand on the many aspects of his career. Contributors include Mark Godfrey, Barbara Engelbach, Tacita Dean, and Lanka Tattersall.
Item nr. 151466